JPH0138063B2 - - Google Patents
Info
- Publication number
- JPH0138063B2 JPH0138063B2 JP59114318A JP11431884A JPH0138063B2 JP H0138063 B2 JPH0138063 B2 JP H0138063B2 JP 59114318 A JP59114318 A JP 59114318A JP 11431884 A JP11431884 A JP 11431884A JP H0138063 B2 JPH0138063 B2 JP H0138063B2
- Authority
- JP
- Japan
- Prior art keywords
- glass
- gas
- optical transmission
- heating
- anhydrous
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000011521 glass Substances 0.000 claims description 42
- 239000005373 porous glass Substances 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 17
- 230000005540 biological transmission Effects 0.000 claims description 15
- 238000000034 method Methods 0.000 claims description 15
- 230000003287 optical effect Effects 0.000 claims description 12
- 150000001875 compounds Chemical class 0.000 claims description 11
- KVSDNQORMGXIMU-UHFFFAOYSA-N [S].FOF Chemical compound [S].FOF KVSDNQORMGXIMU-UHFFFAOYSA-N 0.000 claims description 10
- 239000002245 particle Substances 0.000 claims description 7
- 239000002994 raw material Substances 0.000 claims description 7
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 238000000151 deposition Methods 0.000 claims description 5
- 230000007062 hydrolysis Effects 0.000 claims description 3
- 238000006460 hydrolysis reaction Methods 0.000 claims description 3
- 239000000460 chlorine Substances 0.000 description 23
- 239000007789 gas Substances 0.000 description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 18
- 239000001307 helium Substances 0.000 description 12
- 229910052734 helium Inorganic materials 0.000 description 12
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 12
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 10
- 229910052801 chlorine Inorganic materials 0.000 description 10
- 239000010453 quartz Substances 0.000 description 9
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 8
- 208000005156 Dehydration Diseases 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 6
- 230000018044 dehydration Effects 0.000 description 6
- 238000006297 dehydration reaction Methods 0.000 description 6
- 239000011737 fluorine Substances 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 239000013307 optical fiber Substances 0.000 description 6
- LSJNBGSOIVSBBR-UHFFFAOYSA-N thionyl fluoride Chemical compound FS(F)=O LSJNBGSOIVSBBR-UHFFFAOYSA-N 0.000 description 6
- 238000000354 decomposition reaction Methods 0.000 description 5
- 229910003902 SiCl 4 Inorganic materials 0.000 description 4
- 229910008284 Si—F Inorganic materials 0.000 description 4
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- 229910008051 Si-OH Inorganic materials 0.000 description 3
- 229910006358 Si—OH Inorganic materials 0.000 description 3
- 238000010521 absorption reaction Methods 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 238000005253 cladding Methods 0.000 description 3
- 230000000052 comparative effect Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 150000002222 fluorine compounds Chemical class 0.000 description 3
- 150000003377 silicon compounds Chemical class 0.000 description 3
- 239000005049 silicon tetrachloride Substances 0.000 description 3
- 239000007858 starting material Substances 0.000 description 3
- 238000006467 substitution reaction Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
- 239000005935 Sulfuryl fluoride Substances 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 238000006298 dechlorination reaction Methods 0.000 description 2
- 239000012024 dehydrating agents Substances 0.000 description 2
- 239000001257 hydrogen Substances 0.000 description 2
- 229910052739 hydrogen Inorganic materials 0.000 description 2
- 238000002844 melting Methods 0.000 description 2
- 230000008018 melting Effects 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 230000009257 reactivity Effects 0.000 description 2
- OBTWBSRJZRCYQV-UHFFFAOYSA-N sulfuryl difluoride Chemical compound FS(F)(=O)=O OBTWBSRJZRCYQV-UHFFFAOYSA-N 0.000 description 2
- 101000856246 Arabidopsis thaliana Cleavage stimulation factor subunit 77 Proteins 0.000 description 1
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 1
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 1
- 229910005793 GeO 2 Inorganic materials 0.000 description 1
- 229910004721 HSiCl3 Inorganic materials 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 150000008280 chlorinated hydrocarbons Chemical class 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 229910001882 dioxygen Inorganic materials 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 125000001301 ethoxy group Chemical group [H]C([H])([H])C([H])([H])O* 0.000 description 1
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 1
- 150000004820 halides Chemical class 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 239000003779 heat-resistant material Substances 0.000 description 1
- 230000036571 hydration Effects 0.000 description 1
- 238000006703 hydration reaction Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000001183 hydrocarbyl group Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 230000035699 permeability Effects 0.000 description 1
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 230000007847 structural defect Effects 0.000 description 1
- ZDHXKXAHOVTTAH-UHFFFAOYSA-N trichlorosilane Chemical compound Cl[SiH](Cl)Cl ZDHXKXAHOVTTAH-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
- C03C23/0085—Drying; Dehydroxylation
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B37/00—Manufacture or treatment of flakes, fibres, or filaments from softened glass, minerals, or slags
- C03B37/01—Manufacture of glass fibres or filaments
- C03B37/012—Manufacture of preforms for drawing fibres or filaments
- C03B37/014—Manufacture of preforms for drawing fibres or filaments made entirely or partially by chemical means, e.g. vapour phase deposition of bulk porous glass either by outside vapour deposition [OVD], or by outside vapour phase oxidation [OVPO] or by vapour axial deposition [VAD]
- C03B37/01446—Thermal after-treatment of preforms, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/07—Impurity concentration specified
- C03B2201/075—Hydroxyl ion (OH)
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/08—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant
- C03B2201/12—Doped silica-based glasses doped with boron or fluorine or other refractive index decreasing dopant doped with fluorine
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S65/00—Glass manufacturing
- Y10S65/15—Nonoxygen containing chalogenides
- Y10S65/16—Optical filament or fiber treatment with fluorine or incorporating fluorine in final product
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- General Life Sciences & Earth Sciences (AREA)
- Glass Compositions (AREA)
- Manufacture, Treatment Of Glass Fibers (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59114318A JPS60260434A (ja) | 1984-06-04 | 1984-06-04 | 光伝送用無水ガラス素材の製造方法 |
| US06/739,876 US4650511A (en) | 1984-06-04 | 1985-05-31 | Method for the preparation of a dehydrated quartz glass material for light transmission |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59114318A JPS60260434A (ja) | 1984-06-04 | 1984-06-04 | 光伝送用無水ガラス素材の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60260434A JPS60260434A (ja) | 1985-12-23 |
| JPH0138063B2 true JPH0138063B2 (en]) | 1989-08-10 |
Family
ID=14634844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59114318A Granted JPS60260434A (ja) | 1984-06-04 | 1984-06-04 | 光伝送用無水ガラス素材の製造方法 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4650511A (en]) |
| JP (1) | JPS60260434A (en]) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023275918A1 (ja) | 2021-06-28 | 2023-01-05 | 日本たばこ産業株式会社 | 香味吸引器用のカートリッジの製造方法 |
Families Citing this family (36)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE3735532A1 (de) * | 1987-10-21 | 1989-05-03 | Rheydt Kabelwerk Ag | Verfahren zum herstellen einer vorform fuer lichtwellenleiter |
| US5562752A (en) * | 1994-03-31 | 1996-10-08 | Lucent Technologies Inc. | Process of manufacturing vitreous silica product including hydrothermally treating a colloidal sol-gel |
| BR9811105A (pt) | 1997-07-15 | 2000-11-14 | Corning Inc | Sensibilidade diminuìda de h2 em fibra ótica |
| US6783898B2 (en) | 1999-02-12 | 2004-08-31 | Corning Incorporated | Projection lithography photomask blanks, preforms and method of making |
| US6782716B2 (en) * | 1999-02-12 | 2004-08-31 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| US6319634B1 (en) * | 1999-03-12 | 2001-11-20 | Corning Incorporated | Projection lithography photomasks and methods of making |
| US6265115B1 (en) | 1999-03-15 | 2001-07-24 | Corning Incorporated | Projection lithography photomask blanks, preforms and methods of making |
| US6242136B1 (en) | 1999-02-12 | 2001-06-05 | Corning Incorporated | Vacuum ultraviolet transmitting silicon oxyfluoride lithography glass |
| US6682859B2 (en) * | 1999-02-12 | 2004-01-27 | Corning Incorporated | Vacuum ultraviolet trasmitting silicon oxyfluoride lithography glass |
| US6398844B1 (en) * | 2000-02-07 | 2002-06-04 | Air Products And Chemicals, Inc. | Blanketing molten nonferrous metals and alloys with gases having reduced global warming potential |
| US6521018B2 (en) | 2000-02-07 | 2003-02-18 | Air Products And Chemicals, Inc. | Blanketing metals and alloys at elevated temperatures with gases having reduced global warming potential |
| JP3865039B2 (ja) * | 2000-08-18 | 2007-01-10 | 信越化学工業株式会社 | 合成石英ガラスの製造方法および合成石英ガラス並びに合成石英ガラス基板 |
| US6715322B2 (en) * | 2001-01-05 | 2004-04-06 | Lucent Technologies Inc. | Manufacture of depressed index optical fibers |
| US20040118155A1 (en) * | 2002-12-20 | 2004-06-24 | Brown John T | Method of making ultra-dry, Cl-free and F-doped high purity fused silica |
| JP5277837B2 (ja) | 2008-09-26 | 2013-08-28 | セントラル硝子株式会社 | α−トリフルオロメチル−α，β−不飽和エステル類の製造方法 |
| JP2013230961A (ja) * | 2012-05-02 | 2013-11-14 | Shin-Etsu Chemical Co Ltd | 光ファイバプリフォームの製造方法 |
| KR20180095620A (ko) * | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 행잉 시트 금속 도가니에서 실리카 유리 제품의 제조 |
| CN108698886A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 降低二氧化硅颗粒的碳含量和石英玻璃体的制备 |
| EP3390292B1 (de) | 2015-12-18 | 2023-03-15 | Heraeus Quarzglas GmbH & Co. KG | Herstellung einer synthetischen quarzglaskörnung |
| WO2017103133A1 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellen und nachbehandeln eines quarzglaskörpers |
| KR20180095624A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 불투명 실리카 유리 제품의 제조 |
| WO2017103131A1 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Verringern des erdalkalimetallgehalts von siliziumdioxidgranulat durch behandlung von kohlenstoffdotiertem siliziumdioxidgranulat bei hoher temperatur |
| EP3390308B1 (de) * | 2015-12-18 | 2024-08-28 | Heraeus Quarzglas GmbH & Co. KG | Glasfasern aus quarzglas mit geringem oh-, cl- und al-gehalt |
| TW201733930A (zh) * | 2015-12-18 | 2017-10-01 | 何瑞斯廓格拉斯公司 | 石英玻璃製備中之二氧化矽粉末的氨處理 |
| CN108698891A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 用于熔融烘箱的气体冲洗和制备石英玻璃的方法 |
| WO2017103170A1 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Wasserdampfbehandlung von siliziumdioxidpulver bei der herstellung von quarzglas |
| KR20180095618A (ko) | 2015-12-18 | 2018-08-27 | 헤래우스 크바르츠글라스 게엠베하 ＆ 컴파니 케이지 | 다중-챔버 가열로에서 실리카 유리체의 제조 |
| EP3390300A1 (de) * | 2015-12-18 | 2018-10-24 | Heraeus Quarzglas GmbH & Co. KG | Herstellung eines quarzglaskörpers in einem stehendem sintertiegel |
| TWI812586B (zh) | 2015-12-18 | 2023-08-21 | 德商何瑞斯廓格拉斯公司 | 石英玻璃體、其製備方法與應用、及用於控制烘箱出口處之露點 |
| WO2017103123A2 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern mit taupunktkontrolle im schmelzofen |
| CN108698895A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 在悬挂式烧结坩埚中制备石英玻璃体 |
| EP3390304B1 (de) | 2015-12-18 | 2023-09-13 | Heraeus Quarzglas GmbH & Co. KG | Sprühgranulieren von siliziumdioxid bei der herstellung von quarzglas |
| WO2017103160A1 (de) * | 2015-12-18 | 2017-06-22 | Heraeus Quarzglas Gmbh & Co. Kg | Herstellung von quarzglaskörpern aus siliziumdioxidgranulat |
| CN108698885A (zh) * | 2015-12-18 | 2018-10-23 | 贺利氏石英玻璃有限两合公司 | 石英玻璃制备中硅含量的提升 |
| CN108779015B (zh) * | 2015-12-18 | 2021-10-26 | 贺利氏石英玻璃有限两合公司 | 从二氧化硅粉末制备石英玻璃体 |
| CN111320177B (zh) * | 2020-04-13 | 2023-09-15 | 黄冈师范学院 | 一种去除石英砂粉中羟基的方法 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5852935B2 (ja) * | 1978-11-20 | 1983-11-26 | 三菱マテリアル株式会社 | 光伝送用素材の製造方法 |
| JPS5924092B2 (ja) * | 1978-12-29 | 1984-06-07 | 三菱マテリアル株式会社 | 光フアイバ母材の製造法 |
| JPS6037063B2 (ja) * | 1982-11-19 | 1985-08-23 | 古河電気工業株式会社 | 無水プリフオ−ムロツドの製造方法 |
-
1984
- 1984-06-04 JP JP59114318A patent/JPS60260434A/ja active Granted
-
1985
- 1985-05-31 US US06/739,876 patent/US4650511A/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2023275918A1 (ja) | 2021-06-28 | 2023-01-05 | 日本たばこ産業株式会社 | 香味吸引器用のカートリッジの製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4650511A (en) | 1987-03-17 |
| JPS60260434A (ja) | 1985-12-23 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |